In this laboratory, we have prepared research facilities to realize micro and nanofabrication of various materials such as glass, metal and polydimethylsiloxane (PDMS).
We will introduce principal facilities and equipments here. If you want to know more, please ask us. If you want to see or use or think collaboration, please freely contact us.

Clean room

class 1000

For micro and nanofabrication, very clean circumstance excluding dust in air as much as possible is required. Especially, nanofabrication under 1μm or glass fabrication requiring bonding need very high cleanness.
In this laboratory, we prepared class 1000 (1000 dusts/feet3) to realize stabilized fabrication.
Room is yellow to cut UV light which disturbs UV illumination apparatus.

Electron beam
lithography system


This is the most fundamental equipment for micro and nanofabrication. This machine draws and patterns micro and nano lines on regist membrane by electron beam.
Minimum 10nm class thin line can be drawn. Then, glass micro or nano fabrication is followed, by etching glass surface which becomes bare or sputtering metal membrane for lift-off (removal of part where metal is not attached to glass surface directly) to make a mask.
This machine has a function of scanning electron microscope (SEM) because it scan the surface by electron beam.

Dry etching machine


This is an etching machine for glass and semiconductor.
Processing gas for semiconductor fabrication is changed to plasma and the activated gas is applied to glass or semiconductor surface for etching.
In case of glass, 10μm`100nm fabrication is suitable.

Ion shower
(sputtering, etching)


In this machine, processing gas is ionized and applied to the target surface for etching. Sputtered molecule is directed to membrane formation stage and accumulated on it to form a metal membrane.
This machine can also be used for etching machine by placing glass on target stage.

Mask aligner


This is UV illumination machine with alignment function.
Through a mask made by electron beam lithography system and sputtering machine, UV is illuminated and a part of the regist is exposed. After development, just exposed area is removed and the glass surface becomes bare, and glass etching becomes possible.

Scanning probe

Nanonavi II (SII)

This is a kind of Atomic Force Microscope. This machine scans the surface by probe and measures the surface structure in nano level.
This is used to measure how the surface was fabricated after the fabrication process.

Ultra-pure water
treatment equipment


This machine provides very highly purified water continuously.
This always provides water from normal water, so the contamination is low and can provide large amount of volume compared with normal pure water system. This is indispensable for glass micro fabrication requiring large amount of water for washing in the process.

Vacuum furnace


This machine is a programmable furnace in high temperature.
This is mainly used for thermal fusion of glass . The right hand side small furnace is a muffle furnace without vacuum function.

Milling machine


This machine is used to make a hole for fluidic flow in substrates. This is automatically controlled by NC language.

Plasma Etching System


A compact machine to generate O2 plasma in a vacuum chamber. This process can be utilized to bond materials or prepare hydrophilic surfaces of glass, Si-wafer or PDMS.

Vacuum Evaporation


A compact machine to directly evaporate thin metal layers (nm order) on a variety of substrates (glass, plastic, silicone rubber etc.). For example,” Al-coated” glass slides can be self-prepared in a lab, and the Al-coated glass slides are used as “blank photomasks” for photolithography.

Laser Microscope


A microscope to visualize and analyze 3D structures of fabricated microdevices.

Measuring Microscope


An easy-to-use microscope to evaluate the shape & size of fabricated microdevices in a 3D (X-Y-Z) manner.

Scanning Electron


An easy-to-use SEM for visualizing 3D structures of microdevices under relatively rough vacuum.

Maskless Exposure System


A speedy lithography system to draw micropatterns on blank photomasks with 1 micron resolution.